CVD & PECVD Systems

Compact CVD is widely used for CVD experiment under reaction temperature 800-1600℃, vacuum sintering experiment,vacuum protective atmosphere sintering experiment,nanomaterial preparation,battery preparation,etc.

Compact PE-CVD (Plasma Enhanced Chemical Vapor Deposition) tube furnace system, which consists of RF plasma source,tube furnace, Multi-channels gas flowmeters with gas mixing tank, and high-quality mechanical pump.The PE-CVD furnace is an ideal and affordable tool to deposit thin films or grow nanowire from a gas state (vapor) to a solid state.

Max.temp. Up To 1600℃.
Can be customized according to your needs.