PECVD(Plasma Enhanced Chemical Vapor Deposition) Furnace With Gas Channels & Vacuum Pump

Compact PE-CVD is designed to deposit thin films or grow nanowire from a gas state (vapor) to a solid state and general use up to 1600 °C.
Can be customized according to your needs.

Compact PE-CVD (Plasma Enhanced Chemical Vapor Deposition Furnace) tube furnace system, which consists of RF plasma source,tube furnace, Multi-channels gas flowmeters with gas mixing tank, and high-quality mechanical pump.The PE-CVD furnace is an ideal and affordable tool to deposit thin films or grow nanowire from a gas state (vapor) to a solid state.
Based on the above information,you can choose according to the PECVD furnace with gas channels & vacuum pump image and the table parameters in detail, and then contact us to get the price you expect.

Standard Features

  • 1200°C, 1400°C or 1600°C maximum operating temperature;
  • Hot zone length, single zone 300, 400 or 440 mm;
  • PID automatic control;
  • Accepts work tubes with outer diameters up to 100 mm;
  • Horizontal configuration;
  • Compact structure low power consumption;
  • Heavy duty double layer structure with cooling fan. Lower temperature in outside case.

Accessories (specify these at time of order)

    Standard Accessories:
  • Quartz tube x1 piece for 1200c tube furnace | Alumina tube x 1 piece for 1400c and 1600c tube furnace | Vacuum flanges and Mechanical vacuum gauge x 1 piece | Tube Blocks x 2 pieces | Furnace handle hook x 1 piece | Protective gloves x 1 pair | O rings x 4 pieces | Allen key x 1 piece
  • Optional:
  • Sliding function for tube furnace
  • Multi hot zones for furnace
  • Digital vacuum gauge
  • Touch Screen
  • Float Flowmeter / Mass Flowmeter
  • Different vacuum pump System

Content may be subject to modifications or corrections
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