Tel Number
181-3719-5600
Product introduction:
This customized RTP rapid annealing furnace is a RTP (rapid thermal processing) tube furnace, multi-channel proton flowmeter system and vacuum system, designed for semiconductor substrates and solar cells or other samples (up to 3" in size) Designed for annealing. This equipment is heated by infrared lamps, and the fastest heating rate is 50°C/sec. 30-stage precise temperature control, RS485 interface and control software can control the operation of the furnace through a computer and display the temperature curve.
Technical parameters:
This customized RTP rapid annealing furnace is a RTP (rapid thermal processing) tube furnace, multi-channel proton flowmeter system and vacuum system, designed for semiconductor substrates and solar cells or other samples (up to 3" in size) Designed for annealing. This equipment is heated by infrared lamps, and the fastest heating rate is 50°C/sec. 30-stage precise temperature control, RS485 interface and control software can control the operation of the furnace through a computer and display the temperature curve.
Technical parameters:
|
product name |
Custom RTP system |
|
Part 1: Tube furnace |
|
|
product name |
Open RTP tube furnace with upper and lower temperature zones |
|
temperature |
Up to 1000 degrees |
|
Controller |
LCD touch screen |
|
Furnace tube size |
Quartz tube outer diameter 80mm/inner diameter 72mm single side opening |
|
Heating zone |
300mm |
|
Furnace type |
Open |
|
Power supply |
Voltage: 380V; Frequency: 50 Hz; Three-phase |
|
Heating element |
Halogen heating |
|
Heating rate |
30 C/sec |
|
Thermocouple |
K-type thermocouple measures the temperature of the material |
|
Temperature Controller |
30-segment high-precision digital programmable temperature controller |
|
Part Two Air Mixing System |
|
|
Range |
MFC1: Oxygen (O2) 0-200sccm MFC2: Argon (Ar) 0-200sccm |
|
The third part of the vacuum system |
|
|
Feiyue VDR-4 1L/S + dust filter supporting anti-corrosion digital vacuum gauge |
|
